Consider the following statements:
X-rays are used for lithography in IC technology because
1. high resolution is achievable
2. scattering effects are small
3. they can be focused easily
4. they can be deflected easily
Which of the statements given above are correct?

A. Metals B. Semiconductors C. Insulators D. All of the above

A. Drift of holes B. Diffusion of holes C. Drift of electrons D. Diffusion of electrons

A. Both A and R are true and R is correct explanation of A B. Both A and R are true but R is not a correct explanation of A C. A is true but R is false D. A is false but R is true

A. Forward bias voltage B. Potential barrier C. Rate of thermal generation of electron hole pairs D. None of the above