Increasing the transconductance . . . . . . . .
A. Increases input capacitance
B. Decreasing area occupied
C. Decreasing input capacitance
D. Decrease in output capacitance
Answer: Option A
A. Increases input capacitance
B. Decreasing area occupied
C. Decreasing input capacitance
D. Decrease in output capacitance
Answer: Option A
The dopants are introduced in the active areas of silicon by using which process?
A. Diffusion process
B. Ion Implantation process
C. Chemical Vapour Deposition
D. Either Diffusion or Ion Implantation Process
What are the advantages of E-beam masks?
A. Small feature size
B. Larger feature size
C. Looser layer
D. Complex design
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