Positive photo resists are used more than negative photo resists because . . . . . . . .
A. Negative photo resists are more sensitive to light, but their photo lithographic resolution is not as high as that of the positive photo resists
B. Positive photo resists are more sensitive to light, but their photo lithographic resolution is not as high as that of the negative photo resists
C. Negative photo resists are less sensitive to light
D. Positive photo resists are less sensitive to light
Answer: Option A
This Question Belongs to Electronics And Communications Engineering >> VLSI Design And Testing
The dopants are introduced in the active areas of silicon by using which process?
A. Diffusion process
B. Ion Implantation process
C. Chemical Vapour Deposition
D. Either Diffusion or Ion Implantation Process
What are the advantages of E-beam masks?
A. Small feature size
B. Larger feature size
C. Looser layer
D. Complex design
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