The chemical used for shielding the active areas to achieve selective oxide growth is?
A. Silver Nitride
B. Silicon Nitride
C. Hydrofluoric acid
D. Polysilicon
Answer: Option B
Related Questions on VLSI Design and Testing
The dopants are introduced in the active areas of silicon by using which process?
A. Diffusion process
B. Ion Implantation process
C. Chemical Vapour Deposition
D. Either Diffusion or Ion Implantation Process
What are the advantages of E-beam masks?
A. Small feature size
B. Larger feature size
C. Looser layer
D. Complex design
Join The Discussion