Silicon dioxide is used in Ics
A. Because it facilitates the penetration of diffurants
B. Because of its high heat conduction
C. To control the location of diffusion and to protect and insulate the Si Surface
D. To control the concentration of diffurants
Answer: Option C
Related Questions on Digital Electronics
In which of the following base systems is 123 not a valid number?
A. Base 10
B. Base 16
C. Base 8
D. Base 3

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