43.
In an extrinsic semiconductor the conductivity significantly depends upon:

44.
Consider the following statements regarding the formation of P-N junctions:
1. Holes diffuse across the junction from P-side to N-side.
2. The depletion layer is wiped out.
3. There is continuous flow of current across the junction.
4. A barrier potential is set up across the junction.
Which of the above statements are correct?

45.
The doping concentration on the p-side and n-side of a silicon diode are 1 × 1016 cm-3, and 1 × 1017 cm-3 respectively. A forward bias of 0.3 V is applied to the diode. At T = 300 K, the intrinsic carrier concentration of silicon ni = 1.5 × 1010 cm-3 and $$\frac{{{\text{kT}}}}{{\text{q}}}$$ = 26mV. The electron concentration at the edge of the depletion region on the p-side is

46.
Which of the following is true?

50.
List-I is four different semiconductor devices. Match each device in List-I with its characteristic property in List-II.
List-I List-II
a. BJT 1. Population inversion
b. MOS capacitor 2. Pinch-off voltage
c. LASER diode 3. Early effect
d. JFFT 4. Flat-band voltage

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